Intel uses ASML High NA EUV for Panther Lake chip production

Intel has become the first semiconductor company to use the industry's most advanced lithography technology in commercial production, marking a significant step toward the next generation of chip manufacturing. The company is now employing ASML's High Numerical Aperture Extreme Ultraviolet (High NA EUV) systems to manufacture selected layers of its Panther Lake laptop processors, which are built on its Intel 18A process node.

The milestone, confirmed by ASML, represents a shift from research and testing into production manufacturing. Intel began experimenting with the technology in 2024, installing the first commercial High NA EUV scanner at its research and development facility in Hillsboro, Oregon. The company later qualified a more advanced model, the TWINSCAN EXE5200B, which offers higher throughput and improved accuracy. Intel is using these systems to produce specific, complex layers of the Panther Lake chips while continuing to use conventional EUV equipment for the remaining layers. This approach allows Intel to gain crucial production experience and collect manufacturing data without overhauling its entire fabrication process.

High NA EUV lithography is a more advanced...